000 00753nam a2200241 4500
001 22081
010 _a0-387-56540-X
_bencadernado
_dEsc 14 500$
090 _a22081
100 _a19971229d1993 k||y0pory50 ba
101 _aeng
102 _aUS
200 _aGas source molecular beam epitaxy
_egrowth and properties of phosphorous containing III-IV heterostructures
_fM. B. Panish, H. Temkin
210 _aNew York
_cSpringer-Verlag
_dcop. 1993
215 _aXIV, 428 p.
_cil.
_d24 cm
225 _aSpringer series in materials science
606 _aEpitaxia por feixes moleculares
680 _aQC611.6
700 _aPanish
_bM. B.
701 _aTemkin
_bH.
_4070
_930589
801 _gRPC
_aPT
942 _2lcc
_cA
_n0