| 000 | 00740nam a2200241 4500 | ||
|---|---|---|---|
| 001 | 10922 | ||
| 010 |
_a3-540-53428-8 _bencadernado _dEsc 12 600$ |
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| 090 | _a10922 | ||
| 100 | _a19950215d1991 k||y0pory50 ba | ||
| 101 | _aeng | ||
| 102 | _aDE | ||
| 200 |
_aSputtering by particle bombardment 3 _echaracteristics of sputtered particles, technical applications _fR. Behrisch, K. Wittmaack, ed. lit. |
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| 210 |
_aBerlin _cSpringer-Verlag _dcop. 1991 |
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| 215 |
_aXIII, 410 p. _cil. _d24 cm |
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| 225 | _aTopics in Applied Physics | ||
| 606 | _aFísica molecular | ||
| 680 | _aQC176.8 | ||
| 702 |
_aBehrisch _bR. _4340 _929438 |
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| 702 |
_aWittmaack _bK. _4340 _929439 |
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| 801 |
_gRPC _aPT |
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| 942 |
_2lcc _cA _n0 |
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